Research Catalog

Optical microlithography XIV : 27 February-2 March, 2001, Santa Clara, [California], USA

Title
Optical microlithography XIV : 27 February-2 March, 2001, Santa Clara, [California], USA / Christopher J. Progler, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Publication
Bellingham, Wash. : SPIE, [2001], ©2001.

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Holdings

Details

Additional Authors
  • Progler, Christopher J.
  • Society of Photo-optical Instrumentation Engineers.
  • Semiconductor Equipment and Materials International.
  • International SEMATECH.
Description
2 volumes (xxxi, 1652 pages) : illustrations; 28 cm.
Series Statement
SPIE proceedings series, 0277-786X ; v. 4346
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 4346.
Alternative Title
Optical microlithography fourteen
Subject
  • Integrated circuits > Masks > Congresses
  • Microlithography > Congresses
  • X-ray lithography > Congresses
  • Manufacturing processes > Congresses
Bibliography (note)
  • Includes bibliographic references and author index.
ISBN
0819440329
OCLC
  • ocm48192997
  • SCSB-4225371
Owning Institutions
Columbia University Libraries