Research Catalog

Emerging lithographic technologies VI : 5-7 March, 2002, Santa Clara, [California], USA

Title
Emerging lithographic technologies VI : 5-7 March, 2002, Santa Clara, [California], USA / Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Publication
Bellingham, Washington : SPIE, [2002], ©2002.

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Details

Additional Authors
  • Engelstad, Roxann L.
  • Society of Photo-optical Instrumentation Engineers.
  • Semiconductor Equipment and Materials International.
  • International SEMATECH.
Description
xiv pages, 508 unnumbered pages : illustrations; 28 cm.
Series Statement
Proceedings of SPIE ; v. 4688
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 4688.
Subject
  • Lithography, Electron beam > Congresses
  • Microlithography > Industrial applications > Congresses
  • X-ray lithography > Congresses
  • X-rays > Industrial applications > Congresses
  • Masks (Electronics) > Congresses
Bibliography (note)
  • Includes bibliographic references and author index.
ISBN
0819444340
OCLC
  • ocm50417948
  • SCSB-4299719
Owning Institutions
Columbia University Libraries