Research Catalog
Advances in resist technology and processing XIX : 4-6 March, 2002, Santa Clara, [California] USA
- Title
- Advances in resist technology and processing XIX : 4-6 March, 2002, Santa Clara, [California] USA / Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Publication
- Bellingham, Washington : SPIE, [2002], ©2002.
Items in the Library & Off-site
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2 Items
Status | Vol/Date | Format | Access | Call Number | Item Location |
---|---|---|---|---|---|
v.1 | Text | Request in advance | TK7874 .A25 2002g v.1 | Off-site | |
v.2 | Text | Request in advance | TK7874 .A25 2002g v.2 | Off-site |
Holdings
Details
- Additional Authors
- Description
- 2 volumes : illustrations; 28 cm.
- Series Statement
- SPIE proceedings series ; v. 4690
- Uniform Title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 4690.
- Subject
- Bibliography (note)
- Includes bibliographic references and author index.
- ISBN
- 0819444367
- OCLC
- ocm50554788
- SCSB-4307323
- Owning Institutions
- Columbia University Libraries