Research Catalog

Advances in resist technology and processing XIX : 4-6 March, 2002, Santa Clara, [California] USA

Title
Advances in resist technology and processing XIX : 4-6 March, 2002, Santa Clara, [California] USA / Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Publication
Bellingham, Washington : SPIE, [2002], ©2002.

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Holdings

Details

Additional Authors
  • Fedynyshyn, Theodore H., 1952-
  • Society of Photo-optical Instrumentation Engineers.
  • Semiconductor Equipment and Materials International.
  • International SEMATECH.
Description
2 volumes : illustrations; 28 cm.
Series Statement
SPIE proceedings series ; v. 4690
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 4690.
Subject
  • Photoresists > Congresses
  • Microlithography > Congresses
Bibliography (note)
  • Includes bibliographic references and author index.
ISBN
0819444367
OCLC
  • ocm50554788
  • SCSB-4307323
Owning Institutions
Columbia University Libraries