Research Catalog

Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan

Title
Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan / Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, Japan Society of Applied Physics [and others] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering.
Publication
Bellingham, Washington : SPIE, [2001], ©2001.

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Details

Additional Authors
  • Kawahira, Hiroichi.
  • BACUS (Technical group)
  • Ōyō Butsuri Gakkai.
  • Semiconductor Equipment and Materials International (Japan)
  • Society of Photo-optical Instrumentation Engineers.
  • Photomask Japan Symposium.
Description
xxx, 918 pages : illustrations; 28 cm.
Series Statement
SPIE proceedings series ; v. 4754
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 4754.
Alternative Title
Photomask and X-ray mask technology
Subjects
Note
  • Some earlier proceedings have title: Photomask and X-ray mask technology.
Bibliography (note)
  • Includes bibliographic references and author index.
ISBN
0819445177
OCLC
  • ocm50613555
  • SCSB-4310203
Owning Institutions
Columbia University Libraries