Research Catalog
Automated photomask inspection
- Title
- Automated photomask inspection / Donald B. Novotny and Dino R. Ciarlo.
- Author
- Novotny, Donald B.
- Publication
- Washington : Department of Commerce, National Bureau of Standards, Institute for Applied Technology, Electronic Technology Division : for sale by the Supt. of Docs., U.S. Govt. Print. Off., 1978.
Items in the Library & Off-site
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1 Item
Status | Format | Access | Call Number | Item Location |
---|---|---|---|---|
Text | Request in advance | C 13.10:400-46 | Off-site |
Holdings
Details
- Additional Authors
- Series Statement
- Semiconductor measurement technology
- NBS special publication ; 400-46
- Uniform Title
- Semiconductor measurement technology.
- NBS special publication ; 400-46.
- Subjects
- Note
- Prepared by Electronic Technology Division, Institute for Applied Technology with Lawrence Livermore Laboratory.
- Activity supported by Defense Advanced Research Projects Agency.
- Issued April 1978.
- Bibliography (note)
- Includes bibliographical references.
- LCCN
- 78606023
- OCLC
- ocm03839037
- SCSB-4352359
- Owning Institutions
- Columbia University Libraries