Research Catalog

Automated photomask inspection

Title
Automated photomask inspection / Donald B. Novotny and Dino R. Ciarlo.
Author
Novotny, Donald B.
Publication
Washington : Department of Commerce, National Bureau of Standards, Institute for Applied Technology, Electronic Technology Division : for sale by the Supt. of Docs., U.S. Govt. Print. Off., 1978.

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TextRequest in advance C 13.10:400-46Off-site

Holdings

Details

Additional Authors
  • Institute for Applied Technology (U.S.). Electronic Technology Division.
  • United States. Defense Advanced Research Projects Agency.
  • Lawrence Livermore Laboratory.
Series Statement
  • Semiconductor measurement technology
  • NBS special publication ; 400-46
Uniform Title
  • Semiconductor measurement technology.
  • NBS special publication ; 400-46.
Subjects
Note
  • Prepared by Electronic Technology Division, Institute for Applied Technology with Lawrence Livermore Laboratory.
  • Activity supported by Defense Advanced Research Projects Agency.
  • Issued April 1978.
Bibliography (note)
  • Includes bibliographical references.
LCCN
78606023
OCLC
  • ocm03839037
  • SCSB-4352359
Owning Institutions
Columbia University Libraries