Research Catalog

A production-compatible microelectronic test pattern for evaluating photomask misalignment

Title
A production-compatible microelectronic test pattern for evaluating photomask misalignment / T. J. Russell, D. A. Maxwell, Electron Devices Division, Center for Electronics and Electrical Engineering, National Engineering Laboratory, National Bureau of Standards ; sponsored by the National Bureau of Standards and Advanced Research Projects Agency.
Author
Russell, T. J. (Thomas James), 1943-
Publication
Washington : Department of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., 1979.

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StatusFormatAccessCall NumberItem Location
TextRequest in advance C 13.10:400-51Off-site

Holdings

Details

Additional Authors
  • Maxwell, Dwight A.
  • Center for Electronics and Electrical Engineering (U.S.). Electron Devices Division.
  • United States. Advanced Research Projects Agency.
Series Statement
  • Semiconductor measurement technology
  • NBS special publication ; 400-51
Uniform Title
  • Semiconductor measurement technology.
  • NBS special publication ; 400-51.
Subject
Note
  • Issued Apr. 1979.
Bibliography (note)
  • Includes bibliographical references.
LCCN
79000230
OCLC
  • ocm04591321
  • SCSB-4353568
Owning Institutions
Columbia University Libraries