Research Catalog

Accurate linewidth measurements on integrated-circuit photomasks

Title
Accurate linewidth measurements on integrated-circuit photomasks / John M. Jerke, editor, Electron Devices Division, Center for Electronics and Electrical Engineering, National Engineering Laboratory, National Bureau of Standards.
Publication
Washington : Department of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U.S. Govt. Print. Off., 1980.

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Details

Additional Authors
  • Jerke, John M.
  • Center for Electronics and Electrical Engineering (U.S.). Electron Devices Division.
  • United States. Defense Advanced Research Projects Agency.
  • United States. National Bureau of Standards.
Series Statement
  • Semiconductor measurement technology
  • NBS special publication ; 400-43
Uniform Title
  • Semiconductor measurement technology.
  • NBS special publication ; 400-43.
Subjects
Note
  • This activity was supported by the Defense Advanced Research Projects Agency and the National Bureau of Standards.
  • Issued Feb. 1980.
  • CODEN: XNBSAV.
Bibliography (note)
  • Includes bibliographical references.
OCLC
  • ocm05970600
  • SCSB-4354484
Owning Institutions
Columbia University Libraries