Research Catalog

Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.

Title
Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.
Publication
Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1986.

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Details

Additional Authors
Blais, Phillip D.
Description
vi, 272 p. : ill.; 28 cm.
Series Statement
Proceedings of SPIE--the International Society for Optical Engineering ; v. 632
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 632.
Subject
  • Ion beam lithography > Congresses
  • Lithography, Electron beam > Congresses
  • Microlithography > Congresses
  • X-ray lithography > Congresses
Bibliography (note)
  • Includes bibliographies and index.
ISBN
089252667X
LCCN
86061034
Owning Institutions
Columbia University Libraries