Research Catalog

Optical microlithography XVI : 25-28 February 2003, Santa Clara, California, USA / Anthony Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

Title
Optical microlithography XVI : 25-28 February 2003, Santa Clara, California, USA / Anthony Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

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TextUse in library TK7835 .O65 2003g pt.1Off-site
TextUse in library TK7835 .O65 2003g pt.2Off-site
TextUse in library TK7835 .O65 2003g pt.3Off-site

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Details

Additional Authors
  • International SEMATECH.
  • Semiconductor Equipment and Materials International.
  • Society of Photo-optical Instrumentation Engineers.
  • Yen, Anthony.
Description
3 v. (xxxi, 1764 p.) : ill. (some col.); 28 cm.
Series Statement
SPIE proceedings series, 0277-786X ; v. 5040
Alternative Title
  • Optical Microlithography 16
  • Optical microlithography sixteen
Subject
  • Integrated circuits > Masks > Congresses
  • Manufacturing processes > Congresses
  • Microlithography > Congresses
  • X-ray lithography > Congresses
ISBN
0819448451
Owning Institutions
Columbia University Libraries