Research Catalog

Emerging lithographic technologies VII : 25-27 February, 2003, Santa Clara, California, USA

Title
Emerging lithographic technologies VII : 25-27 February, 2003, Santa Clara, California, USA / Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Publication
Bellingham, Wash. : SPIE, c2003.

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Details

Additional Authors
  • Engelstad, Roxann L.
  • Society of Photo-optical Instrumentation Engineers
  • Semiconductor Equipment and Materials International
  • International SEMATECH.
Description
2 v. : ill.; 28 cm.
Series Statement
Proceedings of SPIE ; v. 5037
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 5037.
Subject
  • Lithography, Electron beam > Congresses
  • Microlithography > Industrial applications > Congresses
  • X-ray lithography > Congresses
  • X-rays > Industrial applications > Congresses
  • Masks (Electronics) > Congresses
Bibliography (note)
  • Includes bibliographical references and author index.
ISBN
0819448427
OCLC
  • ocm52543912
  • SCSB-4826903
Owning Institutions
Columbia University Libraries