Research Catalog
Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA / Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH.
- Title
- Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA / Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH.
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Status | Format | Access | Call Number | Item Location |
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Text | Use in library | TS183 .D37 2004g | Off-site |
Details
- Additional Authors
- Description
- xxx, 248 p. : ill.; 28 cm.
- Series Statement
- SPIE proceedings series, 0277-786X ; v. 5378
- Subjects
- ISBN
- 0819452912
- Owning Institutions
- Columbia University Libraries