Research Catalog

Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA / Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH.

Title
Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA / Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH.

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TextUse in library TS183 .D37 2004gOff-site

Details

Additional Authors
  • International SEMATECH.
  • Semiconductor Equipment and Materials International.
  • Society of Photo-optical Instrumentation Engineers.
  • Tobin, Kenneth W.
Description
xxx, 248 p. : ill.; 28 cm.
Series Statement
SPIE proceedings series, 0277-786X ; v. 5378
Subjects
ISBN
0819452912
Owning Institutions
Columbia University Libraries