Research Catalog
Photomask and next-generation lithography mask technology XI. 14-16 April, 2004, Yokohama, Japan
- Title
- Photomask and next-generation lithography mask technology XI. Part One : 14-16 April, 2004, Yokohama, Japan / Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, The Institute of Electrical Engineers of Japan . . . (et al.); co-organized by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering.
- Publication
- Bellingham, Wash. : SPIE, [2004], ©2004.
Items in the Library & Off-site
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2 Items
Status | Vol/Date | Format | Access | Call Number | Item Location |
---|---|---|---|---|---|
pt.1 | Text | Request in advance | TK7872.M3 P46 2004g pt.1 | Off-site | |
pt.2 | Text | Request in advance | TK7872.M3 P46 2004g pt.2 | Off-site |
Holdings
Details
- Additional Authors
- Description
- 2 volumes : illustrations; 28 cm.
- Series Statement
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 5446
- Uniform Title
- Proceedings of SPIE ; v. 5446.
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 5446.
- Alternative Title
- Photomask and X-ray mask technology
- Subject
- Note
- Some earlier proceedings have title: Photomask and X-ray mask technology.
- Bibliography (note)
- Includes author index.
- ISBN
- 0819453692
- OCLC
- ocm56429753
- SCSB-5075503
- Owning Institutions
- Columbia University Libraries