Research Catalog

Photomask and next-generation lithography mask technology XI. 14-16 April, 2004, Yokohama, Japan

Title
Photomask and next-generation lithography mask technology XI. Part One : 14-16 April, 2004, Yokohama, Japan / Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, The Institute of Electrical Engineers of Japan . . . (et al.); co-organized by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering.
Publication
Bellingham, Wash. : SPIE, [2004], ©2004.

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Details

Additional Authors
  • Tanabe, Hiroyoshi.
  • BACUS (Technical group)
  • Institute of Electrical Engineers of Japan. Japan section.
  • Semiconductor Equipment and Materials International (Japan)
  • Society of Photo-optical Instrumentation Engineers.
  • Photomask Japan Symposium.
Description
2 volumes : illustrations; 28 cm.
Series Statement
Proceedings of SPIE--the International Society for Optical Engineering ; v. 5446
Uniform Title
  • Proceedings of SPIE ; v. 5446.
  • Proceedings of SPIE--the International Society for Optical Engineering ; v. 5446.
Alternative Title
Photomask and X-ray mask technology
Subject
  • Masks (Electronics) > Congresses
  • Integrated circuits > Masks > Congresses
  • X-ray lithography > Congresses
  • Microlithography > Congresses
  • Optoelectronic devices > Design and construction > Congresses
Note
  • Some earlier proceedings have title: Photomask and X-ray mask technology.
Bibliography (note)
  • Includes author index.
ISBN
0819453692
OCLC
  • ocm56429753
  • SCSB-5075503
Owning Institutions
Columbia University Libraries