Research Catalog

Title

Luminous chemical vapor deposition and interface engineering / Hirotsugu Yasuda.

Author

Yasuda, H.

Publication

New York : Marcel Dekker, [2005], ©2005.

Items in the Library & Off-site

Holdings

Details

Description

xii, 819 pages : illustrations; 29 cm

Summary

"This reference provides in-depth coverage of the technologies and various approaches in luminous chemical vapor deposition (LCVD) and showcases the development and utilization of LCVD procedures in industrial scale applications - offering a wide range of examples, case studies, and recommendations for clear understanding of this science."--BOOK JACKET.

Subjects

• Surface chemistry
• Chemical vapor deposition
• Plasma polymerization
• Chemical engineering > Research

Bibliography (note)

• Includes bibliographical references and index.

Contents

Pt. I. Fundamentals of LCVD -- Ch. 1. Introduction -- Ch. 2. Domain of luminous chemical vapor deposition -- Ch. 3. Luminous gas phase -- Ch. 4. Creation of chemically reactive species in luminous chemical vapor deposition -- Ch. 5. Growth and deposition mechanisms -- Ch. 6. Dangling bonds -- Ch. 7. Chemical structures of organic compounds for luminous chemical vapor deposition -- Ch. 8. Deposition kinetics -- Ch. 9. Ablation by luminous gas (low pressure plasma) -- Ch. 10. Competitive ablation and polymerization -- Ch. 11. Internal stress in material formed by luminous chemical vapor deposition -- Pt. II. Operation of LCVD and LCVT -- Ch. 12. Modes of operation and scale-up principle -- Ch. 13. Direct current and alternating current discharge -- Ch. 14. Magnetron discharge for luminous chemical vapor deposition -- Ch. 15. Anode magnetron discharge -- Ch. 16. Low-pressure cascade arc torch -- Ch. 17. Anode magnetron torch -- Ch. 18. Primary, secondary and pulsed discharges -- Ch. 19. Reactor size -- Ch. 20. Flow pattern -- Ch. 21. Composition-graded transition phase -- Ch. 22. Tumbler reactor -- Pt. III. Fundamentals of surface and interface -- Ch. 23. Surface configuration -- Ch. 24. Surface state -- Ch. 25. Surface dynamics -- Ch. 26. Contact angle and wettability -- Ch. 27. Sessile bubble formation and detachment -- Pt. IV. Interface engineering -- Ch. 28. System approach interface engineering -- Ch. 29. Creation of an imperturbable surface -- Ch. 30. Creating adhesion to substrate surface -- Ch. 31. Corrosion protection of aluminum alloys -- Ch. 32. Corrosion protection of ion vapor-deposited aluminum -- Ch. 33. Corrosion protection of cold-rolled steel and pure iron -- Ch. 34. Membrane preparation and modification -- Ch. 35. Application of luminous chemical vapor deposition in biomaterials -- Ch. 36. Economical advantages of luminous chemical vapor deposition.

ISBN

0824757882 (acid-free paper)

LCCN

2005042468

OCLC

• 57414331
• ocm57414331
• SCSB-5142341

Owning Institutions

Columbia University Libraries