Research Catalog

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California

Title
Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
Publication
Bellingham, Wash., USA : The Society, [1988], ©1988.

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Details

Additional Authors
  • Yanof, Arnold W.
  • Society of Photo-optical Instrumentation Engineers.
Description
vi, 307 pages : illustrations; 28 cm.
Series Statement
Proceedings of SPIE--the International Society for Optical Engineering ; v. 923
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 923.
Subject
  • Lithography, Electron beam > Congresses
  • X-ray lithography > Congresses
  • Ion beam lithography > Congresses
Bibliography (note)
  • Includes bibliographies and index.
ISBN
089252958X (pbk.)
LCCN
88060782
OCLC
  • 18446375
  • ocm18446375
Owning Institutions
Columbia University Libraries