Research Catalog

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California

Title
Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
Publication
Bellingham, Wash., USA : The Society, [1989], ©1989.

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Details

Additional Authors
  • Yanof, Arnold W.
  • Society of Photo-optical Instrumentation Engineers.
Description
viii, 388 pages : illustrations; 28 cm.
Series Statement
Proceedings ; v. 1089
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 1089.
Subject
  • Lithography, Electron beam > Congresses
  • X-ray lithography > Congresses
  • Ion beam lithography > Congresses
Bibliography (note)
  • Includes bibliographies and index.
ISBN
0819401242
LCCN
89060655
OCLC
  • 508208332
  • ocn508208332
Owning Institutions
Columbia University Libraries