Research Catalog

Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions

Title
Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions / edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.
Publication
Park Ridge, N.J., U.S.A. : Noyes Publications, [1990], ©1990.

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StatusFormatAccessCall NumberItem Location
TextRequest in advance TA2020 .H37 1989Off-site

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Details

Additional Authors
  • Rossnagel, Stephen M.
  • Cuomo, J. J.
  • Westwood, William D. (William Dickson), 1937-
Description
xxiii, 523 pages : illustrations; 25 cm
Subject
  • Plasma engineering
  • Semiconductors > Etching
  • Plasma etching
Bibliography (note)
  • Includes bibliographical references (p. 509-517) and index.
ISBN
0815512201 :
LCCN
89022834
OCLC
  • 20265048
  • ocm20265048
Owning Institutions
Columbia University Libraries