Research Catalog

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California

Title
Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
Publication
Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1990], ©1990.

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Details

Additional Authors
  • Resnick, Douglas J.
  • Society of Photo-optical Instrumentation Engineers.
Description
viii, 344 pages : illustrations; 28 cm.
Series Statement
Proceedings / SPIE--the International Society for Optical Engineering ; v. 1263
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 1263.
Alternative Title
Submicrometer lithographies nine.
Subject
  • Lithography, Electron beam > Congresses
  • X-ray lithography > Congresses
  • Ion beam lithography > Congresses
Note
  • Includes index.
Bibliography (note)
  • Includes bibliographical references.
ISBN
0819403105
LCCN
90060893
OCLC
  • 21914564
  • ocm21914564
Owning Institutions
Columbia University Libraries