Research Catalog

Dry processing for submicrometer lithography : 12-13 October 1989, Santa Clara, California

Title
Dry processing for submicrometer lithography : 12-13 October 1989, Santa Clara, California / James Bondur, Alan R. Reinberg, chairs/editors ; sponsored by SPIE--The International Society for Optical Engineering ; cooperating organizations, SEMATECH, Center for Advanced Electronics Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison.
Publication
Bellingham, Wash., USA : SPIE, [1990], ©1990.

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Details

Additional Authors
  • Bondur, James.
  • Reinberg, Alan R.
  • Society of Photo-optical Instrumentation Engineers.
  • SEMATECH (Organization)
  • North Carolina State University. Center for Advanced Electronic Materials Processing.
  • University of Wisconsin--Madison. Engineering Research Center for Plasma-Aided Manufacturing.
Description
vii, 307 pages : illustrations; 28 cm.
Series Statement
Proceedings / SPIE--The International Society for Optical Engineering ; v. 1185
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 1185.
Subjects
Bibliography (note)
  • Includes bibliographical references and index.
ISBN
0819402214 (pbk.)
LCCN
89043521
OCLC
  • 508158041
  • ocn508158041
Owning Institutions
Columbia University Libraries