Research Catalog

Atmospheric pressure chemical vapor deposition of hydrogenated amorphous silicon, titanium nitride, and titanium dioxide thin films / by Sarah R. Kurtz.

Title
Atmospheric pressure chemical vapor deposition of hydrogenated amorphous silicon, titanium nitride, and titanium dioxide thin films / by Sarah R. Kurtz.
Author
Kurtz, S. R.
Publication
1985.

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Details

Description
2, v, 254 leaves : ill.; 29 cm.
Subject
  • Thin films
  • Vapor-plating
Thesis (note)
  • Thesis (Ph. D.)--Harvard University, 1985.
Bibliography (note)
  • Includes bibliographical references.
Processing Action (note)
  • committed to retain
Owning Institutions
Harvard Library