Research Catalog

Title

Flat panel display materials : symposium held April 5-6, 1994, San Francisco, California, U.S.A. / editors, J. Batey, A. Chiang, P.H. Holloway.

Publication

Pittsburgh, PA : Materials Research Society, c1994.

Items in the Library & Off-site

Holdings

Details

Additional Authors

• Batey, J.
• Chiang, A.
• Holloway, Paul H.

Description

ix, 339 p. : ill.; 24 cm.

Series Statement

Materials Research Society symposium proceeedings, 0272-9172 ; v. 345

Uniform Title

Materials Research Society symposia proceedings ; v. 345.

Subject

• Liquid crystal displays > Materials > Congresses
• Thin film transistors > Materials > Congresses
• Information display devices > Materials > Congresses

Genre/Form

Conference papers and proceedings

Bibliography (note)

• Includes bibliographical references and indexes.

Contents

• Materials Research Society Symposium Proceedings -- a-Si TFT Technologies for AM-LCDs / Nobuki Ibaraki -- Amorphous Silicon Alloy Photovoltaic Technology -- From R&D to Production / S. Guha, J. Yang, A. Banerjee, T. Glatfelter, K. Hoffman, S. R. Ovshinsky, M. Izu, H. C. Ovshinsky and X. Deng -- Silicon Nitride Optimisation for a-Si:H TFTs Used in Projection LC-TVs / I. D. French, C. J. Curling and A. L. Goodyear -- Effects of N[subscript 2] Plasma Treatment on SiO[subscript 2] Gate Insulator in a-Si:H Thin Film Transistor / Sung Chul Kim, Sung Sig Bae, Eui Yeol Oh, Jeong Hyun Kim, Jong Wan Lee, Cha Yeon Kim and Donggil Kim -- Effect of Ion Doping Temperature on Electrical Properties of APCVD a-Si / Kyung Ha Lee, Byeong Yeon Moon, Yoo Chan Chung, Seung Min Lee, Sung Chul Kim, Donggil Kim and Jin Jang -- Considerations for Large Area Fabrication of Integrated a-Si and Poly-Si TFTs / P. Mei, G. B. Anderson, J. B. Boyce, D. K. Fork, M. Hack, R. I. Johnson, R. A. Lujan and S. E. Ready -- Progress in Large Area Selective Silicon Deposition for TFT/LCD Applications / Jun H. Souk and Gregory N. Parsons -- A Low Temperature Plasma-Assisted Deposition Process for Microcrystalline Thin Film Transistors, TFTs / S. S. He and G. Lucovsky -- In-Situ Crystallization and Doping of a-SI Film by Means of Spin-on-Glass / Tomoyuki Sakoda, Chang-Dong Kim and Masakiyo Matsumura
• Influence of the Deposition Rate of the a-Si:H Channel on the Field-Effect Mobility of TFTs Deposited in a VHF Glow Discharge / H. Meiling, J. F. M. Westendorp, J. Hautala, Z. M. Saleh and C. T. Malone -- The Low Temperature Polysilicon TFT Technology for Manufacturing of Active Matrix Liquid Crystal Displays / Tatsuo Morita, Shuhei Tsuchimoto and Nobuo Hashizume -- A Comprehensive Study of Plasma Enhanced Crystallization of a-Si:H Films on Glass / Aiguo Yin, Stephen J. Fonash, D. M. Reber, Y. M. Li and M. Bennett -- High Mobility Non-Hydrogenated Low Temperature Polysilicon TFTs / F. Plais, P. Legagneux, T. Kretz, R. Stroh, O. Huet and D. Pribat -- Rapid Thermal Crystallization of LPCVD Amorphous Silicon Films / A. T. Voutsas, M. K. Hatalis, K. R. Olasupo, A. K. Nanda and D. Alugbin -- Effect of O[subscript 2] Plasma Exposure on the Performance of Polycrystalline Silicon Thin Film Transistors / Chul Ha Kim, Il Lee, Ki Soo Sohn, Su Chul Chun and Jin Jang -- Improved Abruptness of Si/SiN Interface by ArF Excimer-Laser Pre-Annealing to SiN / Yasutaka Uchida and Masakiyo Matsumura -- Improvement of Grain Size by Crystallization of Double-Layer Amorphous Silicon Films / Dae Gyu Moon, Jeong No Lee, Ho Bin Im, Byung Tae Ahn, Kee Soo Nam and Sang Won Kang -- Deposition of Hydrogenated Si Films by Hydrogenation of the SiO[subscript 2] Surface and Hydrogen Dilution with PE-CVD and ECR-CVD / Kun-Chih Wang, Tri-Rung Yew and Huey-Liang Hwang
• Deposition and Crystallisation Behaviour of Amorphous Silicon Thin Films Obtained by Pyrolysis of Disilane Gas at Very Low Pressure / T. Kretz, D. Pribat, P. Legagneux, F. Plais, O. Huet and M. Magis -- Characteristics of Sub-Micron Polysilicon Thin Film Transistors / Kola R. Olasupo and M. K. Hatalis -- Hydrogenation Mechanism of Top-Gated Polysilicon Thin Film Transistors / Yong-Min Ha, Jung-In Han, Chul-Hi Han and Choong-Ki Kim -- A New Offset Gated Poly-Si TFT Using a Wet Oxidation / B. H. Min, J. M. Oh and M. K. Han -- Crystallization Behavior of the Amorphous Si[subscript 1-x]Ge[subscript x] Films Deposited On SiO[subscript 2] by Molecular Beam Epitaxy (MBE) / Chang-Won Hwang, Myung-Kwan Ryu, Ki-Bum Kim, Seung-Chang Lee and Chang-Soo Kim -- Degradation Phenomena of Low-Temp, Poly-Si TFT's Under Electrical Stress Before and After Hydrogenation / Y. S. Kim, K. Y. Choi, M. C. Jun and M. K. Han -- Flat Panel Display Substrates / Dawne M. Moffatt -- High Deposition Rate PECVD Processes for Next Generation TFT-LCDs / J. F. M. Westendorp, H. Meiling, J. D. Pollock, D. W. Berrian, A. H. Laflamme, Jr., J. Hautala and J. Vanderpot -- New Materials for Laser Repair of Active Matrix Liquid Crystal Displays / Paul B. Comita and Carl E. Larson -- Interfacial Solid-State Oxidation Reactions in the Sn-Doped In[subscript 2]O[subscript 3] on Si and Si[subscript 0.85]Ge[subscript 0.15] Alloy Systems / Cleva W. Ow-Yang, Yuzo Shigesato, Rita Mohanty and David C. Paine
• Surface Analysis of LCD Materials in Various Stages of Production by Time-of-Flight Secondary Ion Mass Spectroscopy (TOF-SIMS) / J. J. Lee, P. M. Lindley and R. W. Odom -- Alignment of Smectic Liquid Crystal Molecules by Grated Glass and Silicon Substrates / L. J. Martinez-Miranda, E. Smela and H. Liu -- Optically Controlled Alignment of Liquid Crystals / Wayne M. Gibbons, Paul J. Shannon and Shao-Tang Sun -- A New Type TFT with Unique Operation and Simple Fabrication Process / Reiji Hattori, Yukinobu Tanida and Junji Shirafuji -- Characterization of Inorganic Contamination in Liquid Crystal Display Materials Using Total Reflection X-Ray Fluorescence (TXRF) / R. S. Hockett and J. M. Metz -- Structural, Optical and Electronic Properties of Semi-Insulating Tin Oxide Thin Films / A. De Acutis, M. C. Rossi and M. Barbetti -- Transparent Conducting Films of GaInO[subscript 3] by Sputtering / J. Kwo, S. A. Carter, R. J. Cava, S. Y. Hou, J. M. Phillips, D. H. Rapkine, G. A. Thomas and R. B. Van Dover -- Mechanisms of Liquid Crystal Alignment on Buffed Polyimide Surfaces / Hirotsugu Kikuchi, J. A. Logan and Do Y. Yoon -- Transparent Conducting Films Grown by Pulsed Laser Deposition / Julia M. Phillips, R. J. Cava, S. Y. Hou, J. J. Krajewski, J. Kwo, J. H. Marshall, W. F. Peck, Jr., D. H. Rapkine, G. A. Thomas and R. B. Van Dover -- Room Temperature Laser Deposited Indium Tin Oxide Films for Display Applications / W. C. Yip, A. Gururaj Bhat and H. S. Kwok
• Challenges for Flat Panel Display Phosphors / H. P. Maruska, T. Parodos, N. M. Kalkhoran and W. D. Halverson -- Laser-Deposition of High Luminance Thin Film Phosphors / J. A. Greer, H. J. Van Hook, M. D. Tabat, H. Q. Nguyen, G. Gammie and P. F. Koufopoulos -- Blue and Yellow Light Emitting Phosphors for Thin Film Electroluminescent Displays / Paul H. Holloway, J.-E. Yu, Phillip Rack, Joseph Sebastian, Sean Jones, Troy Trottier, K. S. Jones, B. Pathangey, T. J. Anderson, S.-S. Sun, R. Tuenge, E. Dickey and C. N. King -- Electrophoretic Deposition of Phosphors for Display Technology / Michael J. Shane, Jan B. Talbot, Esther Sluzky and K. R. Hesse -- Novel Thin Film Light Emitting Diode Display Made of Amorphous Silicon-Based Semiconductors / Dusit Kruangam, Wirote Boonkosum, Somsak Panyakeow and Bancherd DeLong -- Nanocrystalline Silicon Films for Large Area Displays: Preparation and Properties / S. Veprek, H. Tamura, M. Ruckschloss and Th. Wirschem -- Optical Properties of Silicon Clusters Deposited on the Basal Plane of Graphite / L. N. Dinh, L. L. Chase, M. Balooch, L. J. Terminello, R. J. Tench and F. Wooten -- Stress in Molybdenum Films Used for FEA Display Technology / James A. Greer and Guy F. Pagliuca -- Solid-State Luminescent Color Displays / Edward J. A. Pope.

ISBN

1558992456

LCCN

^^^94037470^

OCLC

• 31239271
• SCSB-10087566

Owning Institutions

Harvard Library