Research Catalog
Physical measurement and analysis of thin films, edited by E. M. Murt and W. G. Guldner.
- Title
- Physical measurement and analysis of thin films, edited by E. M. Murt and W. G. Guldner.
- Author
- Eastern Analytical Symposium (1967 : New York)
- Publication
- New York, Plenum Press, 1969.
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Status | Format | Access | Call Number | Item Location |
---|---|---|---|---|
Text | Request in advance | QD73 .E2 1967 | Off-site |
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Details
- Additional Authors
- Description
- xi, 194 p. illus.; 24 cm.
- Series Statement
- Progress in analytical chemistry ; v. 2
- Subject
- Genre/Form
- Congress
- Bibliography (note)
- Includes bibliographies.
- Contents
- Nondestructive optical techniques for thin-film thickness measurements / by W.A. Pliskin -- A review of x-ray methods for investigating thin films and platings / by Eugene P. Bertin -- X-ray fluorescence and electron microprobe techniques for determination of thin-film thickness / by James E. Cline -- Density determination of sputtered tantalum films by a beta-backscatter technique / by Richard Brown -- The characterization of solid thin films and surfaces by electron microscopy and diffraction / by R.B. Marcus -- The emission-spectrographic and atomic-absorption analyses of metallic thin films / by J.D. Nohe -- RF spark source mass spectrometry for the analysis of surface films / by D.L. Malm -- Chemical and structural evaluation of thin glass films / by W.A. Pliskin.
- LCCN
- ^^^68031239^
- OCLC
- 2113
- SCSB-13127433
- Owning Institutions
- Harvard Library