Research Catalog

Title

Modeling of film deposition for microelectronic applications / edited by Stephen Rossnagel.

Publication

San Diego : Academic Press, c1996.

Items in the Library & Off-site

Holdings

Details

Additional Authors

Rossnagel, Stephen M.

Description

xiv, 291 p. : ill.; 24 cm.

Summary

Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 22 volumes since 1963. The series contains quality studies of the properties of various thin filmsmaterials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.

Series Statement

Thin films ; v. 22

Uniform Title

Thin films (San Diego, Calif.) v. 22.

Subject

Thin films > Congresses

Genre/Form

Conference papers and proceedings

Bibliography (note)

• Includes bibliographical references and index.

Processing Action (note)

• committed to retain

Contents

Thin film microstructure and process simulation using SIMBAD / Michael J. Brett, Steven K. Dew, and Tom J. Smy -- Mathematical methods for thin film deposition simulations / S. Hamaguchi -- A process model for sputter deposition of thin films using molecular dynamics / C.-C.Fang ... [et al.] -- Feature scale transport and reaction during low-pressure deposition processes / Timothy S. Cale and Vadali Mahadev.

ISBN

0125330227

OCLC

• 35861306
• SCSB-10226120

Owning Institutions

Harvard Library