Research Catalog

Title

PVD for microelectronics : sputter deposition applied to semiconductor manufacturing / Ronald A. Powell, Stephen M. Rossnagel.

Author

Powell, Ronald A.

Publication

San Diego, Calif. : Academic Press, c1999.

Items in the Library & Off-site

Holdings

Details

Additional Authors

• Powell, Ronald A.
• Rossnagel, Stephen M.

Description

xii, 419 p. : ill.; 24 cm.

Summary

GENERAL DESCRIPTION OF THE SERIES Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films. GENERAL DESCRIPTION OF THE VOLUME This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.

Series Statement

Thin films ; v. 26

Uniform Title

Thin films (San Diego, Calif.) v. 26.

Subject

• Thin film devices > Design and construction
• Vapor-plating
• Thin films

Bibliography (note)

• Includes bibliographical references and indexes.

Processing Action (note)

• committed to retain

ISBN

012533026X

LCCN

^^^98028495^

OCLC

• 39275876
• SCSB-9963581

Owning Institutions

Harvard Library