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Atomic layer deposition of rare-Earth oxides and aluminum catalyzed silica / by Philippe Pierre Marie de Rouffignac.

Title
Atomic layer deposition of rare-Earth oxides and aluminum catalyzed silica / by Philippe Pierre Marie de Rouffignac.
Author
Rouffignac, Philippe Pierre Marie de.
Publication
c2006.

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Description
vii, 164 leaves : ill. (some col.); 29 cm.
Subject
  • Atomic layer deposition
  • Oxides
  • Rare earth metal compounds
  • Silica
  • Thin film devices > Design and construction
Note
  • Thesis advisor: Prof. Roy. G. Gordon.
Thesis (note)
  • Thesis (Ph.D., Dept. of Chemistry and Chemical Biology)--Harvard University, 2006.
Bibliography (note)
  • Includes bibliographical references.
Processing Action (note)
  • committed to retain
Owning Institutions
Harvard Library