Research Catalog

Computational lithography / Xu Ma and Gonzalo R. Arce.

Title
Computational lithography / Xu Ma and Gonzalo R. Arce.
Author
Ma, Xu, 1983-
Publication
Hoboken, N.J. : Wiley, c2010.

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TextRequest in advance TK7872.M3 C66 2010Off-site

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Additional Authors
Arce, Gonzalo R.
Description
xv, 226 p. : ill.; 25 cm.
Summary
A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting.
Series Statement
Wiley series in pure and applied optics
Uniform Title
Wiley series in pure and applied optics.
Subject
  • Integrated circuits > Mathematics
  • Microlithography > Mathematics
  • Photolithography > Mathematics
  • Resolution (Optics)
  • Semiconductors > Mathematics
Bibliography (note)
  • Includes bibliographical references (p. 217-222) and index.
Processing Action (note)
  • committed to retain
Contents
Optical Lithography Systems -- Rule-Based Resolution Enhancement Techniques -- Fundamentals of Optimization -- Computational Lithography with Coherent Illumination -- Regularization Framework -- Computational Lithography with Partially Coherent Illumination -- Other RET Optimization Techniques -- Source and Mask Optimization -- Coherent Thick-Mask Optimization -- Conclusions and New Directions of Computational Lithography -- Appendix A: Formula Derivation in Chapter 5 -- Appendix B: Manhattan Geometry -- Appendix C: Formula Derivation in Chapter 6 -- Appendix D: Formula Derivation in Chapter 7 -- Appendix E: Formula Derivation in Chapter 8 -- Appendix F: Formula Derivation in Chapter 9 -- Appendix G: Formula Derivation in Chapter 10 -- Appendix H: Software Guide.
ISBN
  • 9780470596975 (cloth)
  • 047059697X (cloth)
LCCN
^^2009049250
OCLC
460050552
Owning Institutions
Harvard Library