Research Catalog

Atomic layer deposition and direct-liquid-injection chemical vapor deposition of nickel nitride films and their conversion to nickel silicide films / by Zhefeng Li.

Title
Atomic layer deposition and direct-liquid-injection chemical vapor deposition of nickel nitride films and their conversion to nickel silicide films / by Zhefeng Li.
Author
Li, Zhefeng.
Publication
2011.

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Details

Description
viii, 107 leaves : ill.; 28 cm.
Subject
  • Chemical vapor deposition
  • Silicon-carbide thin films
  • Thin films
Note
  • Thesis advisor: Professor Roy G. Gordon.
  • "May, 2011."
Thesis (note)
  • Thesis (Ph. D.)--Harvard University, 2011.
Bibliography (note)
  • Includes bibliographical references (leaves 105-107).
Processing Action (note)
  • committed to retain
Owning Institutions
Harvard Library