Research Catalog

Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan /

Title
Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan / Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics ... [et al.].
Publication
Bellingham, Washington : SPIE, c1997.

Items in the Library & Off-site

Filter by

1 Item

StatusFormatAccessCall NumberItem Location
Request for On-site UseRequest Scan
Not available - Please for assistance.
TextUse in library TA1505 .P762 vol.3096Off-site

Details

Additional Authors
  • Aizaki, Naoaki.
  • BACUS (Technical group) http://id.loc.gov/authorities/names/n92089299
  • Ōyō Butsuri Gakkai http://id.loc.gov/authorities/names/n82125773
  • Photomask Japan Symposium (4th : 1997 : Kawasaki-shi, Japan)
  • Society of Photo-optical Instrumentation Engineers. http://id.loc.gov/authorities/names/n78088934
Description
xiii, 504 p. : ill.; 28 cm.
Series Statement
Proceedings / SPIE--the International Society for Optical Engineering ; v. 3096
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 3096.
Subjects
Bibliography (note)
  • Includes bibliographical references and index.
ISBN
0819425168
Owning Institutions
Princeton University Library