Research Catalog

Electron-beam, x-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California /

Title
Electron-beam, x-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California / Phillip D. Blais, chairman/editor ; sponsored by SPIE--The International Society for Optical Engineering in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group.
Publication
Bellingham, Wash. : SPIE--The International Society for Optical Engineering, c1983.

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Details

Additional Authors
  • Blais, Phillip D.
  • International Society for Hybrid Microelectronics. http://id.loc.gov/authorities/names/n50037241
  • Northern California Microphotomask/Masking Working Group. http://id.loc.gov/authorities/names/n80015592
  • United States. National Bureau of Standards. http://id.loc.gov/authorities/names/n79021148
Description
viii, 242 p. : ill.; 28 cm.
Series Statement
Proceedings of SPIE--the International Society for Optical Engineering ; v. 393
Alternative Title
Submicron lithographies II.
Subject
  • Photolithography > Congresses
  • Photoresists > Congresses
Bibliography (note)
  • Includes bibliographical references and index.
ISBN
0892524286
LCCN
83061531
Owning Institutions
Princeton University Library