Research Catalog

Electron-beam, x-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California /

Title
Electron-beam, x-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California / Alfred Wagner, chairman-editor ; cooperating organization, the International Society for Hybrid Microelectronics.
Publication
Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1984.

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StatusFormatAccessCall NumberItem Location
TextUse in library TR940 .E432Off-site

Details

Additional Authors
  • International Society for Hybrid Microelectronics. http://id.loc.gov/authorities/names/n50037241
  • Wagner, Alfred.
Description
vi, 136 p. : ill.; 28 cm.
Series Statement
Proceedings of SPIE--the International Society for Optical Engineering ; v. 471
Subjects
Bibliography (note)
  • Includes bibliographical references and index.
ISBN
0892525061
LCCN
84050821
Owning Institutions
Princeton University Library