Research Catalog
Electron-beam, x-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California /
- Title
- Electron-beam, x-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California / Alfred Wagner, chairman-editor ; cooperating organization, the International Society for Hybrid Microelectronics.
- Publication
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1984.
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Status | Format | Access | Call Number | Item Location |
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Not available - Please for assistance. | Text | Use in library | TR940 .E432 | Off-site |
Details
- Additional Authors
- Description
- vi, 136 p. : ill.; 28 cm.
- Series Statement
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 471
- Subjects
- Bibliography (note)
- Includes bibliographical references and index.
- ISBN
- 0892525061
- LCCN
- 84050821
- Owning Institutions
- Princeton University Library