Research Catalog

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California /

Title
Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.

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TextUse in library TK7874.E4355Off-site

Details

Additional Authors
  • Society of Photo-optical Instrumentation Engineers. (uri)http://id.loc.gov/authorities/names/n78088934
  • Yanof, Arnold W.
Description
viii, 388 p. : ill.; 28 cm.
Series Statement
Proceedings ; v. 1089
Subject
  • Ion beam lithography > Congresses
  • Lithography, Electron beam > Congresses
  • X-ray lithography > Congresses
ISBN
0819401242
Owning Institutions
Princeton University Library