Research Catalog
Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California /
- Title
- Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
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Not available - Please for assistance. | Text | Use in library | TK7874.E4355 | Off-site |
Details
- Additional Authors
- Description
- viii, 388 p. : ill.; 28 cm.
- Series Statement
- Proceedings ; v. 1089
- Subject
- ISBN
- 0819401242
- Owning Institutions
- Princeton University Library