Research Catalog

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California /

Title
Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California / Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
Publication
Bellingham, Wash., USA : SPIE, c1991.

Items in the Library & Off-site

Filter by

2 Items

StatusFormatAccessCall NumberItem Location
Request for On-site UseRequest Scan
Not available - Please for assistance.
TextUse in library TK7874 .E4357Off-site
Not available - Please for assistance.
TextUse in library Off-site

Details

Additional Authors
  • Peckerar, Martin Charles, 1946-
  • SPIE Symposium on Microlithography (1991 : San Jose, Calif.)
  • Society of Photo-optical Instrumentation Engineers. http://id.loc.gov/authorities/names/n78088934
Description
x, 340 p. : ill.; 28 cm.
Series Statement
SPIE proceedings series, 0277-786X ; vol. 1465
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 1465.
Subject
  • Ion beam lithography > Congresses
  • Lithography, Electron beam > Congresses
  • X-ray lithography > Congresses
Note
  • "Conference 1465 ... was part of a two-conference program on Lithography Engineering, held at the SPIE Symposium on Microlithography, 3-8 March 1991"--P. viii.
Bibliography (note)
  • Includes bibliographical references and index.
ISBN
0819405647
LCCN
91061058
Owning Institutions
Princeton University Library