Research Catalog

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California /

Title
Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California / David O. Patterson chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.

Items in the Library & Off-site

Filter by

1 Item

StatusFormatAccessCall NumberItem Location
Request for On-site UseRequest Scan
Not available - Please for assistance.
TextUse in library TK7874.E4359 1993Off-site

Details

Additional Authors
  • Patterson, David O.
  • Society of Photo-optical Instrumentation Engineers. (uri)http://id.loc.gov/authorities/names/n78088934
Description
vii, 470 p. : ill.; 28 cm.
Series Statement
SPIE proceedings series, 0277-786X ; vol. 1924
Subject
  • Ion beam lithography > Congresses
  • Lithography, Electron beam > Congresses
  • X-ray lithography > Congresses
ISBN
0819411582
LCCN
93084071
Owning Institutions
Princeton University Library