Research Catalog

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California /

Title
Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International.

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Details

Additional Authors
  • Patterson, David O.
  • Semiconductor Equipment and Materials International. (uri)http://id.loc.gov/authorities/names/n90682619
  • Society of Photo-optical Instrumentation Engineers. (uri)http://id.loc.gov/authorities/names/n78088934
Description
ix, 420 p. : ill.; 28 cm.
Series Statement
SPIE proceedings series, 0277-786X ; vol. 2194
Subject
  • Ion beam lithography > Congresses
  • Lithography, Electron beam > Congresses
  • X-ray lithography > Congresses
ISBN
0819414891
LCCN
94065789
Owning Institutions
Princeton University Library