Research Catalog

Optical microlithography IX : 13-15 March, 1996, Santa Clara, California

Title
Optical microlithography IX : 13-15 March, 1996, Santa Clara, California / Gene E. Fuller, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Publication
Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1996.

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Details

Additional Authors
  • Fuller, Gene E.
  • Society of Photo-Optical Instrumentation Engineers.
  • Semiconductor Equipment and Materials International.
  • SEMATECH (Organization)
Description
2 volumes (xii, 914 pages) : illustrations; 28 cm.
Series Statement
SPIE proceedings series ; v. 2726
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 2726.
Alternative Title
  • Optical microlithography 9
  • Optical microlithography nine
Subject
  • Microlithography > Congresses
  • Integrated circuits > Very large scale integration > Congresses
  • Integrated circuits > Very large scale integration
  • Microlithography
Genre/Form
Conference papers and proceedings.
Bibliography (note)
  • Includes bibliographic references and author index.
Contents
part 1. Plenary papers ; Resolution enhancement ; Circuit/device applications ; Lithography simulation ; Pushing the limits -- pt. 2. Advanced masks ; CD control ; Optical proximity effects ; 193-nm lithography ; Advanced exposure systems ; Exposure tool subsystems.
ISBN
  • 0819421022
  • 9780819421029
LCCN
95072315
OCLC
  • ocm35129243
  • 35129243
  • SCSB-2089517
Owning Institutions
Princeton University Library