Research Catalog

Metrology, inspection, and process control for microlithography X : : 11-13 March, 1996, Santa Clara, California

Title
Metrology, inspection, and process control for microlithography X : : 11-13 March, 1996, Santa Clara, California / Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Publication
Bellingham, Wash., USA : SPIE, c1996.

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Details

Additional Authors
  • Jones, Susan K.
  • Society of Photo-Optical Instrumentation Engineers.
  • Semiconductor Equipmant and Materials International.
  • SEMATECH (Organization)
Description
xiii, 802 p. : ill.; 28 cm.
Series Statement
Proceedings / SPIE--the International Society for Optical Engineering, v. 2725.
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 2725.
Subject
  • Integrated circuits > Inspection > Congresses
  • Integrated circuits > Measurement > Congresses
  • Integrated circuits > Congresses
  • Measurement > Congresses
Note
  • Previous volumes entitled: Integrated circuit metrology, inspection and process control.
Bibliography (note)
  • Includes bibliographic references and author index.
ISBN
0819421014
LCCN
95072314
OCLC
  • ocm35193019
  • SCSB-2090616
Owning Institutions
Princeton University Library