Research Catalog

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California

Title
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Publication
Bellingham, Wash., USA : SPIE, c1996.

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Details

Additional Authors
  • Seeger, David E.
  • Society of Photo-Optical Instrumentation Engineers.
  • Semiconductor Equipment and Materials International.
  • SEMATECH (Organization)
Description
vii, 412 p. : ill.; 28 cm.
Series Statement
SPIE proceedings series ; v. 2723
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 2723.
Subject
  • Integrated circuits > Masks > Congresses
  • Lithography, Electron beam > Congresses
  • X-ray lithography > Congresses
  • Ion beam lithography > Congresses
Bibliography (note)
  • Includes bibliographical references and index.
ISBN
0819420999
LCCN
95072312
OCLC
  • ocm35192949
  • SCSB-2091608
Owning Institutions
Princeton University Library