Research Catalog
16th Annual Symposium on Photomask Technology and Management, 18-20 September 1996, Redwood City, California
- Title
- 16th Annual Symposium on Photomask Technology and Management, 18-20 September 1996, Redwood City, California / Gilbert V. Shelden, James A. Reynolds., chairs/editors ; sponsored by BACUS.
- Author
- Symposium on Photomask Technology and Management (16th : 1996 : Redwood City, Calif.)
- Publication
- Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1996.
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Status | Format | Access | Call Number | Item Location |
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Text | Use in library | TA1505 .P762 vol.2884 | Off-site |
Details
- Additional Authors
- Description
- x, 586 pages : illustrations; 28 cm.
- Series Statement
- SPIE proceedings series ; v. 2884
- Uniform Title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 2884.
- Alternative Title
- Photomask technology and management
- Subject
- Genre/Form
- Conference papers and proceedings.
- Bibliography (note)
- Includes bibliographic references and index.
- Contents
- Keynote address: History and future of mask making / K. Levy -- Photomask patterning -- Photomask resist and process -- Inspection and repair -- Mask metrology -- Advanced mask technologies -- Data, write, and processing techniques for OPC reticles -- Poster session -- BACUS '96 special focus program : defects.
- ISBN
- 0819422827
- 9780819422828
- LCCN
- 96069366
- OCLC
- ocm36420598
- 36420598
- SCSB-2104073
- Owning Institutions
- Princeton University Library