Research Catalog

16th Annual Symposium on Photomask Technology and Management, 18-20 September 1996, Redwood City, California

Title: 16th Annual Symposium on Photomask Technology and Management, 18-20 September 1996, Redwood City, California / Gilbert V. Shelden, James A. Reynolds., chairs/editors ; sponsored by BACUS.
Author: Symposium on Photomask Technology and Management (16th : 1996 : Redwood City, Calif.)
Publication: Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1996.

Items in the Library & Off-site

Filter by

1 Item

Item details
Status	Format	Access	Call Number	Item Location
Request for On-site Use Request Scan How do I pick up this item and when will it be ready?	Text	Use in library	TA1505 .P762 vol.2884	Off-site

Details

Additional Authors

Description

x, 586 pages : illustrations; 28 cm.

Series Statement

SPIE proceedings series ; v. 2884

Uniform Title

Proceedings of SPIE--the International Society for Optical Engineering ; v. 2884.

Alternative Title

Photomask technology and management

Subject

Genre/Form

Conference papers and proceedings.

Bibliography (note)

Includes bibliographic references and index.

Contents

Keynote address: History and future of mask making / K. Levy -- Photomask patterning -- Photomask resist and process -- Inspection and repair -- Mask metrology -- Advanced mask technologies -- Data, write, and processing techniques for OPC reticles -- Poster session -- BACUS '96 special focus program : defects.

ISBN

0819422827
9780819422828

LCCN

96069366

OCLC

ocm36420598
36420598
SCSB-2104073

Owning Institutions

Princeton University Library