Research Catalog

Advances in resist technology and processing XIV : 10-12 March, 1997, Santa Clara, California

Title
Advances in resist technology and processing XIV : 10-12 March, 1997, Santa Clara, California / Régine G. Tarascon-Auriol, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Publication
Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1997.

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Details

Additional Authors
  • Tarascon-Auriol, Régine G.
  • Society of Photo-Optical Instrumentation Engineers.
  • Semiconductor Equipment and Materials International.
  • SEMATECH (Organization)
  • SPIE Symposium on Microlithography (1997 : Santa Clara, Calif.)
Description
xv, 1028 pages : illustrations; 28 cm.
Series Statement
SPIE proceedings series, 0277-786X ; v. 3049
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 3049.
Alternative Title
Resist technology and processing XIV
Subject
  • Photoresists > Congresses
  • Microlithography > Congresses
  • Résines photosensibles > Congrès
  • Microlithographie > Congrès
  • Microlithography
  • Photoresists
Genre/Form
Conference papers and proceedings.
Note
  • "Papers presented at the 14th conference on Advances in Resist Technology and Processing, held ... as part of the 1997 SPIE Symposium on Microlithography"--Page xv.
Bibliography (note)
  • Includes bibliographical references and index.
Contents
Plenary session -- Mechanistic and materials aspects of 193-nm resists -- Lithographic materials for 193-nm lithography -- Characterization methods for chemically amplified resists -- Modeling aspects of chemically amplified resists -- Materials aspects of chemically ampilified resists -- Process development of chemically amplified resists -- Mechanistic aspects of novolac/DNQ resists -- Processes using antireflective layers/top-surface imaging -- Poster session: Chemically amplified systems -- Poster session: Dissolusion inhibition systems -- Poster session: Electron-beam/x-ray resists applications -- Poster session: New materials and characterization methods -- Poster session: Process development.
ISBN
  • 0819424633
  • 9780819424631
OCLC
  • ocm37380395
  • 37380395
  • SCSB-2125400
Owning Institutions
Princeton University Library