Research Catalog

Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California

Title
Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Publication
Bellingham, Wash., USA : SPIE, c1997.

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Details

Additional Authors
  • Seeger, David E.
  • Society of Photo-Optical Instrumentation Engineers.
  • Semiconductor Equipment and Materials International.
  • SEMATECH (Organization)
Description
ix, 412 p. : ill.; 28 cm.
Series Statement
SPIE proceedings series ; v. 3048
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 3048.
Subject
  • Lithography, Electron beam > Congresses
  • X-ray lithography > Congresses
  • Masks (Electronics) > Congresses
Bibliography (note)
  • Includes bibliographical references and index.
ISBN
0819424625
OCLC
  • ocm37533590
  • SCSB-2125906
Owning Institutions
Princeton University Library