Research Catalog

Title

Thin films : interdiffusion and reactions / edited by J.M. Poate, K.N. Tu, J.W. Mayer ; sponsored by the Electrochemical Society, inc.

Publication

New York : Wiley, ©1978.

Items in the Library & Off-site

Details

Additional Authors

• Poate, J. M.
• Tu, K. N. (King-Ning), 1937-
• Mayer, James W., 1930-

Description

x, 578 pages : illustrations; 24 cm.

Series Statement

The Electrochemical Society series

Uniform Title

Electrochemical Society series

Subject

• Thin films
• Semiconductors
• semiconductor
• Semiconductors
• Thin films
• Dünne Schicht
• Aufsatzsammlung
• Thin films > Electric properties
• Semiconducteurs

Note

• "A Wiley-Interscience publication."

Bibliography (note)

• Includes bibliographies and indexes.

Contents

An overview / J.M. Poate, K.N. Tu, J.W. Mayer -- Effect of thin film interactions on silicon device technology / R. Rosenberg, M.J. Sullivan, J.K. Howard -- Chemistry and physics of solid-solid interfaces / J.C. Phillips -- The semiconductor-conductor interface / J.O. McCaldin, T.C. McGill -- Thin film deposition and characterization / K.N. Tu, S.S. Lau -- Depth profiling techniques / J.W. Mayer, J.M. Poate -- Grain boundary diffusion / D. Gupta, D.R. Campbell, P.S. Ho -- Electromigration in thin films / F.M. d'Heurle, P.S. Ho -- Metal-metal interdiffusion / J.E.E. Baglin, J.M. Poate -- Silicide formation / K.N. Tu, J.W. Mayer -- Metal-compound semiconductor reactions / A.K. Sinha, J.M. Poate -- Solid phase epitaxy / S.S. Lau, W.F. van der Weg -- Effect of interfacial reactions on the electrical characteristics metal-semiconductor contacts / E.H. Nicollian, A.K. Sinha -- Ion-implanted metal layers / S.M. Myers.

ISBN

• 0471022381
• 9780471022381
• 0471002381 (canceled/invalid)

LCCN

77025348

OCLC

• ocm03481161
• 3481161
• SCSB-9325075

Owning Institutions

Princeton University Library