Research Catalog

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California

Title
Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Philip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
Publication
Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1985.

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Additional Authors
  • Blais, Philip D.
  • Society of Photo-optical Instrumentation Engineers.
  • International Society for Hybrid Microelectronics.
Description
vi, 219 p. : ill.; 28 cm.
Series Statement
Proceedings of SPIE--the International Society for Optical Engineering ; v. 537
Alternative Title
Electron beam, X-ray, and ion beam techniques for submicrometer lithographies four.
Subject
  • X-ray lithography > Congresses
  • Lithography, Electron beam > Congresses
  • Ion beam lithography > Congresses
Bibliography (note)
  • Includes bibliographies and index.
ISBN
089252572X
LCCN
85061233
OCLC
  • ocm12425377
  • SCSB-620868
Owning Institutions
Princeton University Library