Research Catalog

Process and device modeling

Title
Process and device modeling / edited by W.L. Engl.
Publication
Amsterdam ; New York : North-Holland ; New York, N.Y., U.S.A. : Sole distributors for the U.S.A. and Canada, Elsevier Science Pub. Co., 1986.

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TextUse in library TK7871.85 .P749 1986Off-site

Details

Additional Authors
Engl, Walter L.
Description
x, 461 pages : illustrations; 25 cm.
Series Statement
Advances in CAD for VLSI ; v. 1
Uniform Title
Advances in CAD for VLSI ; v. 1.
Subject
  • Semiconductors > Mathematical models
  • Integrated circuits > Mathematical models
  • Aufsatzsammlung
  • Halbleiter
  • Integrierte Schaltung
  • Mathematisches Modell
  • Mikroelektronik
  • Prozesssimulation
  • Simulation
  • VLSI
  • Semiconducteurs > Modèles mathématiques
  • Circuits intégrés > Modèles mathématiques
  • Semiconducteurs > Modèles techniques
  • Circuits intégrés > Modèles techniques
  • Aufsatzsammlung
  • Halbleiter
  • Integrierte Schaltung
  • Mathematisches Modell
  • Mikroelektronik
  • Prozesssimulation
  • Simulation
  • VLSI
Bibliography (note)
  • Includes bibliographies and index.
ISBN
  • 0444878912
  • 9780444878915
  • 0444878904
  • 9780444878908
LCCN
85027403
OCLC
  • ocm12809975
  • 12809975
  • SCSB-9332171
Owning Institutions
Princeton University Library