Research Catalog

Title

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.

Publication

Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1990.

Items in the Library & Off-site

Details

Additional Authors

• Resnick, Douglas J.
• Society of Photo-Optical Instrumentation Engineers.

Description

viii, 344 p. : ill.; 28 cm.

Series Statement

SPIE proceedings series ; v. 1263

Uniform Title

Proceedings of SPIE--the International Society for Optical Engineering ; v. 1263.

Alternative Title

• Electron-beam, X-ray, and ion-beam technology IX
• Electron-beam, X-ray, and ion-beam submicrometer lithographies IX
• Submicrometer lithographies IX
• Electron-beam, X-ray, and ion-beam techniques for submicron lithographies.
• Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies.
• Electron-beam, x-ray, and ion-beam lithographies.

Subject

• Microlithography > Congresses
• Masks (Electronics) > Congresses
• Lithography, Electron beam > Congresses
• X-ray lithography > Congresses
• Ion beam lithography > Congresses
• Ion beam lithography
• Lithography, Electron beam
• Masks (Electronics)
• Microlithography
• X-ray lithography
• Kongress
• Lithographie (Halbleitertechnologie)

Genre/Form

• Conference papers and proceedings.
• San Jose (Calif., 1990)

Note

• Includes index.

Bibliography (note)

• Includes bibliographical references.

Contents

Ion-beam lithography -- X-ray lithography -- Electron-beam lithography -- Electron-beam and x-ray resist technology -- Poster session: Beam lithography -- Additional paper: Advanced chemically amplified resist / H. Takahashi [and others].

ISBN

• 0819403105
• 9780819403100

LCCN

90060893

OCLC

• ocm21914564
• 21914564
• SCSB-1888124

Owning Institutions

Princeton University Library