Research Catalog
12th Annual Symposium on Photomask Technology and Management, 23-24 September 1992, Sunnyvale, California
- Title
- 12th Annual Symposium on Photomask Technology and Management, 23-24 September 1992, Sunnyvale, California / sponsored by BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology.
- Author
- Symposium on Photomask Technology and Management (12th : 1992 : Sunnyvale, Calif.)
- Publication
- Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1993.
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| Status | Format | Access | Call Number | Item Location |
|---|---|---|---|---|
Not available - Please for assistance. | Text | Use in library | TK7874 .S9434 1992 | Off-site |
Details
- Additional Authors
- Description
- ix, 286 pages : illustrations; 28 cm.
- Series Statement
- SPIE proceedings series ; v. 1809
- Uniform Title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 1809.
- Alternative Title
- Twelfth Annual Symposium on Photomask Technology and Management
- Photomask technology and management
- Subject
- Genre/Form
- Conference papers and proceedings.
- Note
- "In 1992 an Advanced Process Technology session was added to the symposium"--Page ix.
- Bibliography (note)
- Includes bibliographical references and index.
- Additional Formats (note)
- Also available in an electronic version.
- Contents
- Advanced lithography -- Advanced process technology -- Advanced metrology -- Pelliclization and cleaning -- Inspection and repair -- Quality and business -- Phase-shifting masks.
- ISBN
- 0819410098
- 9780819410092
- LCCN
- 92062651
- OCLC
- ocm27931620
- 27931620
- SCSB-1980993
- Owning Institutions
- Princeton University Library