Research Catalog
Integrated circuit metrology, inspection, and process control VIII : 28 February-2 March, San Jose, California
- Title
- Integrated circuit metrology, inspection, and process control VIII : 28 February-2 March, San Jose, California / Marylyn Hoy Bennett, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Publication
- Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1994.
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| Status | Format | Access | Call Number | Item Location |
|---|---|---|---|---|
| Text | Use in library | TK7874 .I54688 1994 | Off-site |
Details
- Additional Authors
- Description
- ix, 553 pages : illustrations; 28 cm
- Series Statement
- SPIE proceedings series ; v. 2196
- Uniform Title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 2196.
- Subject
- Integrated circuits > Inspection > Congresses
- Integrated circuits > Measurement > Congresses
- Microlithography > Quality control > Congresses
- Optical measurements > Congresses
- Scanning electron microscopes > Congresses
- Process control > Congresses
- Integrated circuits > Inspection
- Integrated circuits > Measurement
- Microlithography > Quality control
- Optical measurements
- Process control
- Scanning electron microscopes
- Genre/Form
- Conference papers and proceedings.
- Note
- "1994 Symposium took place in San Jose, California, from February 28 through March 4, 1994".
- Bibliography (note)
- Includes bibliographical references and index.
- Contents
- Optical metrology -- SEM metrology -- Particle and defect metrology -- Lithographic process control -- Registration and overlay -- Modeling -- Registration, overlay, and electrical metrology -- Current issues in metrology.
- ISBN
- 0819414913
- 9780819414915
- LCCN
- 94065791
- OCLC
- ocm30416514
- 30416514
- SCSB-2015914
- Owning Institutions
- Princeton University Library