Research Catalog

Stress-induced phenomena in metallization : second international workshop, Austin, TX, March 1993

Title
Stress-induced phenomena in metallization : second international workshop, Austin, TX, March 1993 / editors, Paul S. Ho, Che-Yu Li, Paul Totta.
Author
International Workshop on Stress-Induced Phenomena in Metallization (2nd : 1993 : University of Texas at Austin)
Publication
New York : American Institute of Physics, ©1994.

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StatusFormatAccessCall NumberItem Location
TextUse in library TK7871.85 .S766 1994Off-site

Details

Additional Authors
  • Ho, P. S.
  • Li, Che-Yu.
  • Totta, Paul.
Description
vii, 302 pages : illustrations; 25 cm
Series Statement
AIP conference proceedings ; no. 305
Uniform Title
AIP conference proceedings ; no. 305.
Subject
  • Semiconductors > Defects > Congresses
  • Integrated circuits > Defects > Congresses
  • Interconnects (Integrated circuit technology) > Defects > Congresses
  • Metallic films > Defects > Congresses
  • Thin film devices > Defects > Congresses
  • Aluminum films > Defects > Congresses
  • Metallizing > Congresses
  • Electrodiffusion > Congresses
  • Strains and stresses > Congresses
  • Strains and stresses
  • Electrodiffusion
  • Integrated circuits > Defects
  • Metallizing
  • Semiconductors > Defects
  • Thin film devices > Defects
Genre/Form
Conference papers and proceedings
Note
  • "DOE CONF-9303142"--T.p. verso.
Bibliography (note)
  • Includes bibliographical references and index.
Additional Formats (note)
  • Also available in an electronic version.
Contents
Direct Observation of the Growth and Movement of Electromigration Voids Under Passivation / T.N. Marieb, E. Abratowski, J.C. Bravman, M. Madden and P. Flinn -- Statistics of Stress Migration and Electromigration Failures of Passivated Interconnect Lines / M.A. Korhonen, P. Borgesen, D.D. Brown, C.-Y. Li, T.D. Sullivan and P.A. Totta -- Effects of Oxygen Addition During Al Deposition on Stress-Migration Induced Failure in Al Lines / H. Okabayashi and K. Aizawa -- X-Ray Determination of Strains, Stress, and Relaxation in Interconnect Metallizations / P.R. Besser and J.C. Bravman -- Thermal Stress and Plastic Deformation of Al Fine Line Structures: Effects of Oxide Confinement and Line Geometry / P.S. Ho, I.-S. Yeo, S.G.H. Anderson and C.K. Hu -- Predictive Modeling for Stress-Induced Void Formation in Al Lines / T.D. Sullivan -- Degradation of Passivated Aluminum Metallization by Mechanical and Electrical Stress / M. Schneegans and G.M. Zorn.
ISBN
  • 1563962519
  • 9781563962516
LCCN
94070650
OCLC
  • ocm30564183
  • 30564183
  • SCSB-2026732
Owning Institutions
Princeton University Library