Research Catalog

14th Annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California

Title
14th Annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California / William L. Brodsky, Gilbert V. Shelden, chairs/editors : sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.
Author
Symposium on Photomask Technology and Management (14th : 1994 : Santa Clara, Calif.)
Publication
Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1994.

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StatusFormatAccessCall NumberItem Location
TextUse in library TK7874 .S9434 1994Off-site

Details

Additional Authors
  • Brodsky, William L.
  • Shelden, Gilbert V.
  • BACUS (Technical group)
Description
vii, 454 p. : ill.; 28 cm.
Series Statement
SPIE proceedings series ; v. 2322
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 2322.
Alternative Title
Photomask technology and management.
Subject
  • Integrated circuits > Masks > Congresses
  • Microlithography > Congresses
Bibliography (note)
  • Includes bibliographical references and index.
ISBN
0819416533
LCCN
94067248
OCLC
  • ocm31907938
  • SCSB-9333475
Owning Institutions
Princeton University Library