Research Catalog

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California

Title
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California / John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International.
Publication
Bellingham, Wash., USA : SPIE, c1995.

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Details

Additional Authors
  • Warlaumont, John M.
  • Society of Photo-Optical Instrumentation Engineers.
  • Semiconductor Equipment and Materials International.
Description
vii, 450 p. : ill.; 28 cm.
Series Statement
SPIE proceedings series, 0277-786X ; vol. 2437
Uniform Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 2437.
Subject
  • Lithography, Electron beam > Congresses
  • X-ray lithography > Congresses
  • Ion beam lithography > Congresses
Bibliography (note)
  • Includes bibliographical references and index.
ISBN
0819417858
LCCN
94069900
OCLC
  • ocm32644238
  • SCSB-9333037
Owning Institutions
Princeton University Library