Research Catalog

  • Chemical mechanical planarization of microelectronic materials / Joseph M. Steigerwald, Shyam P. Murarka, Ronald J. Gutmann.

    • Text
    • New York : J. Wiley, c1997.
    • 1997
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 98-55Offsite
  • Copper : fundamental mechanisms for microelectronic applications / Shyam P. Murarka, Igor V. Verner, Ronald J. Gutmann.

    • Text
    • New York ; Chichester [England] : John Wiley, c2000.
    • 2000
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 00-1026Offsite
  • Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses : fundamental mechanisms and application to IC interconnect technology / by Christopher L. Borst, William N. Gill, Ronald J. Gutmann.

    • Text
    • Boston : Kluwer Academic Publishers, c2002.
    • 2002
    • 1 Item
    FormatCall NumberItem Location
    Text JSE 02-2045Offsite
  • Chemical mechanical planarization of microelectronic materials / Joseph M. Steigerwald, Shyam P. Murarka, Ronald J. Gutmann.

    • Text
    • New York : J. Wiley, [1997], ©1997.
    • 1997-1997
    • 1 Item
    FormatCall NumberItem Location
    Text TK7871 .S77 1997Off-site

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