Research Catalog

  • Materials for microlithography : radiation-sensitive polymers : based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984 / L.F. Thompson, editor, C.G. Willson, editor, J.M.J. Fréchet, editor.

    • Text
    • Washington, D.C. : The Society, 1984.
    • 1984
    • 1 Item
    FormatCall NumberItem Location
    Text JSK 76-18 v. 266Offsite

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